ELECTRODE FOR PLASMA WORKING Russian patent published in 2004 - IPC

FIELD: cathode units of plasmotron used at thermal and thermo-chemical treatment of metals, namely at plasma-arc processes for cutting, welding, depositing, surfacing.

SUBSTANCE: copper holder has dead opening in its end. Cylindrical bimetallic cathode insert is mounted in said opening along its axis. Said insert includes core of hafnium-zirconium alloy and envelope. Relation of surface areas of cross sections of envelope and core is in range (0.5 - 0.7) : 1. Relation of insert length and its outer diameter is in range 0.75 - 4.5. Eccentricity value of cathode insert relative to holder is no more than 0.1 mm. Aluminum layer may be placed between envelope and core. Insert and holder are joined to single unit by die forging process. Constructional parameters of insert of electrode are selected according to increased resource of electrode.

EFFECT: increased useful life period of electrode due to effective heat contact and geometry accuracy at making it, enhanced condition for cooling members.

7 cl, 2 dwg