SUBNANOSECOND ELECTRON BEAM GENERATOR Russian patent published in 2004 - IPC

FIELD: shaping and generating charged particle beams in cathode fluorescence analyses of materials, plasmochemistry, quantum electronics, and the like.

SUBSTANCE: proposed subnanosecond electron beam generator designed for shaping high-energy (hundreds of keV) subnanosecond electron beams (t ≤ 1 ns) of current density amounting to tens of amperes per cm² in gas diode held at atmospheric and higher pressure has gas diode and nanosecond pulse generator 1 with peaking discharger whose high-voltage lead 3 is connected to gas-diode cathode 4. Gas-diode anode 5 is made of foil or net; it may be flat or with curvature radius greater than that of cathode. Novelty is that generator storage capacitor is made in the form of short shaping line with pulse length across matched load being maximum 1 ns. Discharge circuit inductance and surface of gas diode insulator 6 are sufficient for applying voltage to gas diode. Peaking discharger operating time is lower than 1 ns and gas pressure within diode is 1 at or higher. In addition first lead 2 of peaking discharger is made in the form of cylindrical shell to form coaxial line of low wave impedance and main energy storage between case of generator 7 and outer surface of discharger lead. Second lead 3 is disposed coaxially to first one and is made in the form of rod that forms, together with inner surface of first lead, second coaxial line of high wave impedance terminating in cathode made in the form of convex graphite pellet in metal frame.

EFFECT: enhanced energy of subnanosecond electron beams.

2 cl, 1 dwg