METHOD FOR GENERATING SUBNANOSECOND ELECTRON BEAM Russian patent published in 2005 - IPC

Abstract RU 2244361 C1

FIELD: cathode-luminescent analysis of materials, plasmochemistry, quantum electronics, and the like.

SUBSTANCE: proposed method designed for shaping high-energy (hundreds of keV) subnanosecond (t ≤ 1 ns) charged particle beams whose current density amounts to tens of amperes per cm² in gas-filled gap at atmospheric and higher pressure involves following procedures. Volumetric pulsed discharge is effected in gas-filled electrode gap and electron beam is shaped during breakdown of discharge gap as soon as parameter U/(p x d) is brought to value sufficient for shaping runaway electron beam between front of plasma propagating from cathode and anode and volumetric discharge plasma moving to anode is shaped by pre-ionization of gap with fast electrons formed across voltage pulse wavefront due to intensifying field on anode and/or on cathode plasma spots, where U is voltage, V; p is gas pressure, torr; d is gas-filled gap, mm.

EFFECT: enhanced energy and current density of generated subnanosecond electron beams.

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RU 2 244 361 C1

Authors

Alekseev S.B.

Orlovskij V.M.

Tarasenko V.F.

Dates

2005-01-10—Published

2003-10-27—Filed