FIELD: charged particle beam generation for quantum electronics, cathode-luminescent analyses, plasma chemistry, and other fields.
SUBSTANCE: proposed method for enhancing density of sub-nanosecond electron beam that can be used in studying interaction between charged particle flow and some material includes firing of volumetric high-voltage pulsed discharge in gas-filled gap between electrodes at reduced gas pressures P: Pmin ≤ P < 300 torr, where Pmin is minimal gas pressure at which beam current length is not over -0.25 ns and can be gradually varied within specified range between approximately 0.1 and 0.25 ns. Maximal current density and beam current value are approximately 2.2 kA/cm2 and 1 kA, respectively.
EFFECT: ability of varying gas pressure within specified limits.
1 cl, 1 dwg
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