ELECTRON BEAM GENERATION PROCESS Russian patent published in 1998 - IPC

Abstract RU 2113033 C1

FIELD: generation of accelerated charge particle beams for quantum electronics, plasma chemistry, etc. SUBSTANCE: space pulse discharge is initiated in gas-filled gap between electrodes. Electron beam is shaped by avalanche breeding of initial electron beam in discharge at pressure close to atmospheric value with discharge current chosen to ensure compensation for space charge formed in discharge during development of electron avalanches; electric field strength is chosen to exceed threshold value for developing avalanches of running electrons. EFFECT: improved quantity and energy of beam electrons, lifetime of beam, and pressure at which beam- shaping discharge occurs.

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RU 2 113 033 C1

Authors

Kutsyk I.M.

Babich L.P.

Mozgovoj A.L.

Dates

1998-06-10Published

1997-02-20Filed