METHOD FOR DISPERSED MATERIAL PLASMA TREATMENT Russian patent published in 1994 - IPC

Abstract SU 1810025 A1

FIELD: plasma technology. SUBSTANCE: argon is fed into a discharge chamber of a high-frequency induction plasmatron at the flow rate of 20 l/min. An induction discharge is formed in the discharge chamber of the high-frequency induction plasmatron by a high-frequency power supply source. A longitudinal strong-current electric arc discharge is additionally formed in an induction discharge area of the high-frequency induction plasmatron by a low-frequency power supply source, with said arc discharge combined with the high-frequency induction discharge. The arc discharge and the high-frequency induction discharge power densities are determined by the relationship , where P_a.d. and P_h.f.in.d. are the linear power densities of the arc discharge and the high-frequency induction discharge, respectively. EFFECT: enlarged operating capabilities. 1 dwg

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SU 1 810 025 A1

Authors

Usov V.F.

Korotkij V.M.

Dates

1994-05-15—Published

1991-04-22—Filed