SOLUTION FOR CHEMICAL POLISHING TITANIUM Russian patent published in 2005 - IPC

FIELD: chemical polishing of metals.

SUBSTANCE: invention relates to a solution used in chemical polishing metals. The solution contains oxidizing agent, fluorine-containing compound and water wherein hydroxylamine sulfate of the formula: [(NH₂OH)₂ x H₂SO₄] or hydroxylamine hydrochloride of the formula: [NH₂OH x HCl] is used as an oxidizing agent, and acid ammonium fluoride of the formula: [NH₄F x HF] or acid alkaline metal fluorine-containing salt: acid potassium fluoride of the formula: [KF x HF] or acid sodium fluoride of the formula: [NaF x HF] are used a fluorine-containing compound in the following ratio of components, g/l: hydroxylamine sulfate or hydroxyl amine hydrochloride, 200-250; fluorine-containing compound, 60-80, and water, up to 1 l. Invention provides diminishing removal of metal by 2-3 times, to enhanced working capacity of thy solution in polishing by above 1.5-fold and to increase the relative smoothing degree by 10-14%. Invention can be used for preliminary treatment of article surfaces made of titanium before ion-plasma spraying of titanium nitride layer in making compressor vanes for gaseous and aviation industry, for providing decorative form of articles in jewelry industry, and in preparing surface before applying metal covers.

EFFECT: improved and valuable properties of solution.

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