FIELD: electric engineering, possible use for manufacturing electronic memorizing devices.
SUBSTANCE: electrolytic cells of sub-millimeter or sub-micron dimensions are manufactured by photo-lithography on flat surface of plate made of semiconductor or electric-isolating material, electrode zones are formed on which by photo-lithographic methods. Low amount of electrolyte in a cell and low concentration of potential-detecting substance in electrolyte provide for decreased time and decreased amount of electric energy, required for changing stable logical condition of electrolytic cell. Because potential of cell may change in broad limits, electro-chemical cell may be used as multi-level memory cell. Usage of several electrode zones in a cell allows measuring or changing logical condition of cell by means of any combination of pairs of electrodes and in any direction.
EFFECT: broad capabilities for creating microchips of various architectures.
2 cl, 7 dwg
