METHOD FOR PRODUCING A FLUORINE-POLYMER LAYER ON THIN-FILM DEVICE Russian patent published in 2007 - IPC H01L21/312 

FIELD: thin-film devices.

SUBSTANCE: method for producing a fluorine-polymer layer on thin-film device includes: a) feeding of fluorine-monomer in gas phase and initiator in gas phase of free radical polymerization to aforementioned thin-film device, b) mixing of aforementioned fluorine-monomer in gas phase and aforementioned initiator in gas phase of free radical polymerization for creation of gas-phase mixture of aforementioned fluorine monomer and aforementioned initiator of free radical polymerization, c) contacting of aforementioned thin-film device with aforementioned gas-phase mixture of aforementioned fluorine monomer and aforementioned initiator of free radical polymerization, and d) initiation of polymerization of aforementioned fluorine monomer with aforementioned initiator of free radical polymerization, by means of which aforementioned fluorine monomer is polymerized with creation of fluorine polymer layer in aforementioned thin-film device.

EFFECT: possible production of even films with required properties by means of chemical steam precipitation method.

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