METHOD FOR MEASURING CLEANNESS OF SUBSTRATE SURFACES Russian patent published in 2007 - IPC G01N19/08 

FIELD: micro-electronics, possible use during production of integration micro-chips on active and passive substrates and in diffraction optics during products of diffraction optics elements.

SUBSTANCE: during realization of method, shift of probe-substrate is performed along the surface of the substrate being examined, which are positioned in substrate holders at an angle to each other. Shift of probe-substrate is performed by means of lifting of free end of substrate holder with the substrate being studied held in it for an angle relatively to horizontal plane, at which working points of probe-substrate moves from its position. Value of the angle is used as interaction parameter, on basis of which cleanness of substrate surface is evaluated.

EFFECT: increased productivity, increased precision.

2 dwg