METHOD TO MEASURE PURITY OF SUBSTRATE SURFACES Russian patent published in 2014 - IPC G01N19/08 

FIELD: measurement equipment.

SUBSTANCE: invention relates to the field of measurement equipment and may be used in microelectronics in production of integrated microcircuit chips on active and passive substrates and in diffraction optics in production of diffraction microprofiles. The method consists in the fact that they shift a probe substrate along the surface of the investigated substrate, which are arranged at the angle to each other. This angle is created towards the motion of the probe substrate. Shift of the probe substrate is carried out by increasing the angle between the investigated surface and the plane of horizon, by the angle, at which the probe substrate shift is made, they judge on purity of substrate surface, at the same time in process of sliding of the probe substrate they meet the inequation γ≤±16°, where γ - angle between the angle bisector at the top of the contacting face of the probe substrate and the sliding trajectory.

EFFECT: provision of the possibility to eliminate mechanical damages of a surface and increased accuracy of measurement process.

6 dwg