METHOD OF MEASURING SUBSTRATE SURFACE PURITY Russian patent published in 2010 - IPC G01N13/02 G01N21/88 

FIELD: physics.

SUBSTANCE: method involves depositing a droplet of liquid on the surface of the analysed substrate. Further, the droplet is illuminated with light with uniformly distributed intensity on the section of the light flux. Intensity of the light flux is then determined using a photodetector matrix, which is used to determine drop spreading parametres of the liquid. Purity of the surface of the substrate is determined by comparing the obtained parametres with standard parametres. The parametre used for controlling degree of purity is length of the wetting channel and its width given the inequality 16°<α<56°, where α is angle of inclination of the surface of the substrate to the horizontal, is satisfied. A standard curve of drop spreading parametres of the liquid versus substrate surface purity is plotted from which numerical value of surface purity is determined through application of numerical values of width and length of the wetting channel onto the said curve.

EFFECT: increased accuracy of measuring substrate surface purity and increased efficiency.

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