FIELD: atomic industry; chemical industry; other industries; devices for sealing of the porous annular substrates by the chemical gaseous impregnation.
SUBSTANCE: the invention is pertaining to the devices for sealing of the porous annular substrates by the chemical gaseous impregnation, in particular, for the furnace and heater. The furnace of chemical gaseous impregnation for sealing of the annular porous substrates set in the form of the grate number of vertical annular piles contains the current collector having the internal lateral wall limiting the gas heating area and the reaction chamber inside the furnace, and the bottom wall, and also, at least, one through hole for feeding of the gas through the bottom wall of the current collector and the gas heater. The gas heater contains: the ring made our of the heat-conducting material resting on the bottom wall of the current collector separating the gas heating chamber, with the hole for the gas feeding into the heating chamber; the heat exchanger disposed in the gas heating chamber; the gas-distribution- plate resting on the ring and covering from above the gas heating chamber with the grate number of the holes for the heated gas; the loading plate bearing the piles of the annular substrates with a lot off the holes communicating with the- corresponding holes of the gas-distribution plate and matched by the position- with the internal volumes of the appropriate piles of the annular substrates-. The heater also contains the nozzles mounted in the channels used for maintaining of the connection between the gas heating area and- the internal volumes of the corresponding piles of the annular substrates and intended for adjustment of the streams of the heated gas fed in these internal volumes.
EFFECT: the invention ensures, that the presented gas heater ensure adjustment of the streams of the heated gas fed into the reaction chamber located inside the corresponding furnace.
18 cl, 8 dwg
