METHOD OF SURFACE FINISH CONTROL FOR DIELECTRIC SUBSTRATES Russian patent published in 2008 - IPC G01N21/88 

FIELD: physics.

SUBSTANCE: surface under test is cleared by plasma etching in an inert gas medium in the modes preventing substrate material dispersion. Right after the clearing the substrate is set horizontally, and a fluid drop of given volume is dropped onto it from the height within the 6 to 22 mm range. The time of the drop spread over the surface, between the moment the drop touches the substrate surface and till the fluid spread over the substrate surface stops, is measured. Surface finish of the substrate is defined by correlation of the obtained drop spread time and the standard dependency measured in advance.

EFFECT: increased productivity and control sensitivity.

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