FIELD: microelectronics, optical and mechanical industries, defense industry. SUBSTANCE: invention is related to methods of surface flaw detection used to test quality of high-class surfaces having roughness not less than $$$ of transparent and opaque materials including optical, monocrystalline and metal surfaces. Tested surface in agreement with method is activated in high-frequency plasma of arc discharge by cathodeless method in argon atmosphere not allowing material of tested surface to be sputtered. Immediately after activation layer of liquid crystal 1.0 $$$ thick is applied to surface, is protected by covering glass and planar texture is formed. Activation process ensures good wettability of surface with liquid crystal which is necessary condition for formation of planar texture. Defects of machining and of polyunitization not visible during customary observation are visualized when examined surface is tested in polarized passing light or in reflected light. EFFECT: enhanced efficiency of method. 2 cl
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Authors
Dates
1996-11-20—Published
1992-12-28—Filed