METHOD OF PRODUCTION OF TRICHLOROSILANE BY PLASMA CHEMICAL HYDROGENATION OF SILICON TETRACHLORIDE AND DEVICE TO THIS END Russian patent published in 2009 - IPC C01B33/107 

Abstract RU 2350558 C2

FIELD: chemistry.

SUBSTANCE: atmospheric hydrogen plasma is produced in plasma generator 1. Mix of hydrogen and silicon tetrachloride is fed tangentially, through 3 to 8 torus-like pipeline inlets into mixing chamber 5. Transport hydrogen and plasma hydrogen-to-silicon tetrachloride molar ratio is kept up equal to (1.5÷2.0):1. The mix of hydrogen, trichlorosilane and hydrogen chloride produced in hydrogen reduction reactor 2 is fed into condensation unit 22.

EFFECT: improved method of producing trichlorosilane.

2 cl, 2 dwg

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RU 2 350 558 C2

Authors

Gromov Gennadij Nikolaevich

Bolgov Mikhail Viktorovich

Muravitskij Stepan Aleksandrovich

Gavrilov Petr Mikhajlovich

Revenko Jurij Aleksandrovich

Levinskij Aleksandr Ivanovich

Gushchin Vladimir Vasil'Evich

Petrusevich Fedor Viktorovich

Dates

2009-03-27Published

2007-05-02Filed