SIMPLE SYSTEM OF CHEMICAL DEPOSITION FROM VAPOURS AND PLATING METHODS OF MANY-METALLIC ALUMINIDE COATINGS Russian patent published in 2009 - IPC C23C16/06 C23C16/44 C23C16/54 

Abstract RU 2352685 C2

FIELD: metallurgy.

SUBSTANCE: invention relates to system an method of chemical deposition of vapours (CDV) for plating on jet detail aluminide coating and can be used while manufacturing and repair of jets. It is implemented plating, consisting two or more number of impurity metallic components. Aluminide coating is able to form protective complex oxide at following heating in oxidising medium. At least one of impurity metal in aluminide coating is delivered in the form of separated vapor-phase reagent from container, connected by closed passage with reaction chamber of CDV system and free from gas-carrier. Aluminide coating is formed by means of chemical unification of vapor-phase reagent with other vapor-phase reagent, formed either on place in reaction chamber, or fed by gas-carrier to reaction cham from the source of parent substance.

EFFECT: it is received a qualitative coating.

37 cl, 3 dwg

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RU 2 352 685 C2

Authors

Fehjrbourn Dehvid K.

Dates

2009-04-20Published

2004-07-01Filed