PROTECTED SURFACES OF ALLOYS IN MICRO CHANNEL DEVICES, CATALYSTS, ALUMINIUM OXIDE-BASED CATALYSTS, INTERMEDIATE CATALYSTS AND METHOD OF PRODUCING CATALYSTS AND MICRO CHANNEL DEVICES Russian patent published in 2010 - IPC B01J19/02 C23C16/04 C23C10/50 B01J35/04 B01J37/02 

Abstract RU 2403967 C2

FIELD: process engineering.

SUBSTANCE: invention relates to micro channel reactors and catalysts that comprises a layer of metal aluminide. Micro channel reactor consists of complex micro channel constricted by one micro channel wall and aluminide coat applied on the surface of one micro channel wall. Note here that complex micro channel represents an inner micro channel deferring in one or several following characteristics: one continuous micro channel with turn section, turn angle of 45°, length of 20 cm or more, height and width of 2 mm or less; one micro channel is divided into two sub channels arranged in parallel; complex micro channel makes on of adjacent micro channels with the length of common adjacent section of 1 cm whereon several connecting holes are made on common micro channel wall. Note here that total area of said holes does not exceed 20% of that of micro channel wall whereon said holes are located, while area of each hole does not exceed 1.0 mm2. Complex micro channel represents one of five parallel 1 cm-long micro channels. Open ends of said channels communicated with common collector. One size of said collector is thrice the minimum length and width of parallel micro channels. Aluminide layer provides for chemical stability. Besides aluminide increases in metal diffusion from reactor walls to make solid and homogeneous coat for all inner surfaces even in complex-shape channels.

EFFECT: accurate control over chemical processes in complex micro channels, stable operation.

17 cl, 14 dwg

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RU 2 403 967 C2

Authors

Jang Barri L.

Dehli Frehnsis P.

Uotson Dzhanko M.

Mazanets Terri

Fitsdzheral'D Shon P.

Dzhonson Brehdli R.

Li Sjaokhong

Sao Chun'She

Chin Ja-Khuehj

Tonkovich Anna Lii

Arora Ravvi

Khesse Dehvid Dzh.

K'Ju Dongming

Takha Rashid

Rehmler Dzheffri Dzh.

Vang Jong

Long Richard

Dates

2010-11-20Published

2005-03-23Filed