FIELD: chemistry; mechanics.
SUBSTANCE: invention concerns crystallisation pan manufacturing for polycrystalline silicon crystallisation, and preparation and application of adhesion coatings for crystallisation pans used for processing of molten materials solidified in crystallisation pan and extracted in ingot form. Crystallisation pan 1 for silicon crystallisation includes: a) main case 2 with lower surface 21 and side walls 22 forming internal space; b) middle layer 3 with 50 to 100 wt % of silicon dioxide at side wall 22 surface facing internal space; and c) surface layer 4 with 50 to 100 wt % of silicon nitride, up to 50 wt % of silicon dioxide and up to 20 wt % of silicon applied over middle layer 3. Crystallisation pan can also includeadditional middle layer 31 applied over the first middle layer 3 and containing up to 50 wt % of silicon nitride and the rest of silicon dioxide.
EFFECT: eliminated necessity of too thick coating for end user equipment, fast manufacturing of crystallisation pan at low cost, enhanced durability and wall adhesion of coating.
14 cl, 4 tbl, 2 dwg
