FIELD: chemistry.
SUBSTANCE: steam-gas mixture of the direct trichlorosilane synthesis products is separated by the condensation with following separation of the components with rectification. The condensation includes two stages, i.e. preliminary and exhaustive, the preliminary stage is carried out successively in two steps in temperature range +52÷+50°C (1st step) and (+45÷+43)°C (2nd step).
EFFECT: invention allows complete separating of the high-boiling polysilane chlorides from the main part of trichlorosilane on the preliminary stage, decreasing of the energy consumption and process environment, increasing of the end-products yield.
1 tbl, 9 ex
Title | Year | Author | Number |
---|---|---|---|
METHOD FOR DEEP PURIFICATION OF TRICHLOROSILANE FROM HIGH-BOILING COMPOUNDS | 2010 |
|
RU2426691C1 |
METHOD OF OBTAINING POLYCRYSTALLINE SILICON | 2018 |
|
RU2674955C1 |
POLYCRYSTALLINE SILICON PROCESS | 2007 |
|
RU2357923C2 |
METHOD OF SEPARATING METHYLSHLORIDE FROM VAPOUR/GAS MIXTURE OF PRODUCTS OF THE DIRECT SYNTHESIS OF METHYLCHLORSILANES | 0 |
|
SU1502557A1 |
METHOD OF PRODUCING POLYCRYSTALLINE SILICON | 2011 |
|
RU2475451C1 |
METHOD OF ISOLATING HIGH-PURITY TRICHLOROSILANE FROM REACTION MIXTURE OF METHYLCHLOROSILANES | 2007 |
|
RU2341457C1 |
METHOD OF PRODUCTION 0F TRICHLOROSILANE | 2004 |
|
RU2280010C1 |
METHOD OF PRODUCTION OF TRICHLOROSILANE | 2002 |
|
RU2214364C1 |
METHOD OF REMOVAL OF POLYSILANE CHLORIDES FROM STEAM-GAS MIXTURE DISCHARGED FROM INSTALLATIONS OF HYDROGEN REDUCTION OF SILICON AND DEVICE FOR ITS REALISATION | 2007 |
|
RU2344993C1 |
METHOD OF CONTINUOUS UNMIXING MIXTURE OF ETHYL CHLOROSILANE | 2018 |
|
RU2682330C1 |
Authors
Dates
2009-06-20—Published
2007-10-17—Filed