DEVICE FOR CONTROLLING PROCESS OF DRY ETCHING STRUCTURE-FORMING LAYER OF MICROCHIP Russian patent published in 2009 - IPC H01L21/66 B82B1/00 

FIELD: physics.

SUBSTANCE: invention can be used in depositing and analysing thin-film structures, especially during production and controlling semiconductor microchips through dry etching. The device for controlling process of dry etching the structure-forming layer of a microchip in a vacuum chamber has a light source and a light beam formation system, which is based on a reflected light microscope, fitted with a monochromatic high-resolution digital video camera which is connected to a computer. The optical microscope is mounted outside the vacuum chamber with possibility of normal illumination of the section of the surface of the etched layer and reception of reflected light beam by its objective lens through an optical window which is built into the vacuum chamber. The device also has a microcontroller and a light-emitting diode driver. The light source is a pulsed lighter, which is based on a multicolour light-emitting diode, connected to the control output of the microcontroller through the light-emitting diode driver, and the control input of the microcontroller is connected to the output of frame synchronous pulses of the video camera.

EFFECT: increased accuracy and reliability of the device.

4 cl, 4 dwg