NOVEL APPLICATIONS OF PORPHYRIN COMPOUNDS Russian patent published in 2010 - IPC A61K31/409 C07D487/22 A61P31/00 

FIELD: medicine.

SUBSTANCE: invention relates to application of compound of formula I or II given below in preparation of medication for elimination or attenuation of microorganisms' growth in the way which includes subjection of said compound to exposure to source of light of photodynamic therapy or source of ultrasound of ultrasonic (sonodynamic) therapy, where X₁, X₂, X₃ and X₄ independently represent hydrogen atom, lipophylic part of molecule, phenyl group, lower alkyl, alkaryl or aralkyl group or cationic group of the following formula: -L-R₁-N⁺(R₂)(R₃)R₄ where: L represents binding (linking) part of molecule or is absent; R₁ represents lower alkylene, lower alkenylene or lower alkinylene, which is optionally substituted with one or several substituents selected from lower alkyl, lower alkylene (optionally interrupted with oxygen), fluorine, OR₅, C(O)R₆, C(O)OR₇, C(O)NR₈R₉, NR₁₀R₁₁ and N⁺R₁₂R₁₃R₁₄; and R₂, R₃ and R₄ independently represent H, aryl, lower alkyl, lower alkenyl or lower alkinyl, three latter of which are optionally substituted with one or several substituents selected from lower alkyl, lower alkylene (optionally interrupted with oxygen), aryl, OR₅, C(O)R₆, C(O)OR₇, C(O)NR₈R₉, NR₁₀R₁₁ and N⁺R₁₂R₁₃R₁₄; Z represents -CH or N; Y₁, Y₂, Y₃ and Y₄ are absent or independently represent aryl, lower alkyl, lower alkenyl or lower alkinyl, three latter of which are optionally substituted with one or several substituents selected from lower alkyl, lower alkylene (optionally interrupted with oxygen), aryl, OR₅, C(O)R₆, C(O)OR₇, C(O)NR₈R₉, NR₁₀R₁₁ and N⁺R₁₂R₁₃R₁₄, or, taken together with pyrrolic ring, to which they are bound, can form cyclic group; and R₅, R₆, R₇, R₈, R₉, R₁₀, R₁₁, R₁₂, R₁₃ and R₁₄ independently represent H or lower alkyl; M represents element of metal or metalloid; on condition that at least one of X₁, X₂, X₃ and X₄ is cationic group, defined above, and at least one of X₁, X₂, X₃ and X₄ represents hydrogen atom, phenyl group, lipophylic part of molecule or lower alkyl, alkaryl or aralkyl group, said microorganisms being selected from bacteria, mycoplasms, yeasts and/or fungi. Invention also relates to method of treating patient who needs treatment with antimicrobial agent and method of eliminating microorganisms in vitro, including contact of said microorganisms with compound of formula

and

EFFECT: novel application of porphyrin compounds as antimicrobial agent, said microorganisms being selected from bacteria, mycoplasms, yeasts or fungi.

67 cl, 13 dwg, 4 tbl, 7 ex