VAPOUR-GAS MIXTURE SOURCE Russian patent published in 2010 - IPC G01N30/04 

Abstract RU 2399043 C1

FIELD: physics.

SUBSTANCE: vapour-gas mixture source has a mixer which has connecting pieces for inlet and outlet of the vapour-gas mixture. The vapour-gas mixture source also has a diffusion pipe filled with working fluid and an auxiliary pipe designed for filling the diffusion pipe with working fluid. Part of the diffusion pipe is filled with substance which retains the working fluid. The level of working fluid in the auxiliary pipe is lower than the level of substance in the diffusion pipe. The substance which retains the working fluid used can be sand, granular material with particle size between 10 and 10000 mcm, porous substances, e.g. ceramic metal etc.

EFFECT: more accurate measurement and maintenance of concentration of the vapour-gas mixture coming out of the source, provision for constant diffusion flow of vapour of working fluid into the mixer.

11 cl, 2 dwg

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RU 2 399 043 C1

Authors

Budovich Vitalij L'Vovich

Dates

2010-09-10Published

2009-08-04Filed