FIELD: physics.
SUBSTANCE: invention describes a method of producing heat resistant material for making a matrix triad of light filters for active matrix liquid-crystal screens, involving successive formation of a discrete coloured microrelief from a photosensitive composition and a dye. The photosensitive composition used is photoresist which contains silicon-containing poly(o-hydroxyamide) based on a product of polycondensation of 3,3'-dihydroxy-4,4'-diaminodiphenylmethane and bis-(3-aminopropyl)dimethylsiloxane in weight ratio ranging from 9:1 to 1:9 with dichloride of isophthalic acid, o-aminophenol and epichlorohydrin in an amide solvent, photosensitive component β,β-bis-naphthoquinonediazido-(1,2)-5-sulphoether-(4-hydroxy-phenyl)propane and acid photogenerator β,β-bis-naphthoquinonediazido-(1,2)-4- sulphoether-(4-hydroxy-phenyl)propane, with subsequent addition of a dye from a triad of dyes into the photosensitive composition, formation of a coloured microrelief on the substrate and thermal baking at 200-220°C.
EFFECT: formation of a high-resolution coloured microrelief and band-pass filters on glass substrates and narrowband contrast lines in active matrix liquid-crystal screens.
5 cl, 1 tbl, 7 ex
Title | Year | Author | Number |
---|---|---|---|
METHOD OF FORMING MATRIX TRIADS OF LIGHT FILTERS FOR ACTIVE-MATRIX LIQUID CRYSTAL SCREENS | 2008 |
|
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RU2373246C2 |
LIGHT-SENSITIVE COMPOSITION FOR PRODUCING DIELECTRIC LAYERS OF THICK-FILM MICROCIRCUITS | 0 |
|
SU1123012A1 |
POSITIVE PHOTORESIST | 1994 |
|
RU2100835C1 |
Authors
Dates
2010-11-20—Published
2008-07-23—Filed