METHOD OF PRODUCING HEAT RESISTANT MATERIAL FOR MAKING MATRIX TRIAD OF LIGHT FILTERS Russian patent published in 2010 - IPC G03F7/75 G03C7/06 

Abstract RU 2404446 C2

FIELD: physics.

SUBSTANCE: invention describes a method of producing heat resistant material for making a matrix triad of light filters for active matrix liquid-crystal screens, involving successive formation of a discrete coloured microrelief from a photosensitive composition and a dye. The photosensitive composition used is photoresist which contains silicon-containing poly(o-hydroxyamide) based on a product of polycondensation of 3,3'-dihydroxy-4,4'-diaminodiphenylmethane and bis-(3-aminopropyl)dimethylsiloxane in weight ratio ranging from 9:1 to 1:9 with dichloride of isophthalic acid, o-aminophenol and epichlorohydrin in an amide solvent, photosensitive component β,β-bis-naphthoquinonediazido-(1,2)-5-sulphoether-(4-hydroxy-phenyl)propane and acid photogenerator β,β-bis-naphthoquinonediazido-(1,2)-4- sulphoether-(4-hydroxy-phenyl)propane, with subsequent addition of a dye from a triad of dyes into the photosensitive composition, formation of a coloured microrelief on the substrate and thermal baking at 200-220°C.

EFFECT: formation of a high-resolution coloured microrelief and band-pass filters on glass substrates and narrowband contrast lines in active matrix liquid-crystal screens.

5 cl, 1 tbl, 7 ex

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RU 2 404 446 C2

Authors

Rudaja Ljudmila Ivanovna

Shamanin Valerij Vladimirovich

Klimova Natal'Ja Vladimirovna

Lebedeva Galina Konstantinovna

Bol'Shakov Maksim Nikolaevich

Marfichev Aleksej Jur'Evich

Dates

2010-11-20Published

2008-07-23Filed