FIELD: optics.
SUBSTANCE: invented method can be used for creation of complex diffracting optical elements (DOE) - Fresnel lens, kinoforms, focusers, correctors and others; the method includes coating of photoresist layer on the substrate, drying operation, exposure process, film development, thermohardening and reactive or plasma etch chemistry of the substrate by the mixture of gasses through the masking layer of the photoresist thermohardened layer; the thermoresistant photosensitive composition of poly (o-hydroxyamid) on the basis of 3,3'-dihydroxy-4,4'-diaminodiphenylmethane and iso-phthaloylchloridum with photosensitive derivatives of 1,2-naphthoquinone diazides can be used as photoresists; the substrate warmed up to 80-90°С is coated with the photoresist; drying is executed at 90±10°С during 30-40 minutes; thermohardening is performed in vacuum ((2-4)х10-5 mm hg) with smooth increase of the temperature from 200 to 370°С within 10-15 minutes with a sequent exposure to the temperature of 370°С for 30 minutes; ionic and reactive plasma etch chemistry is executed by the mixture of gases: SiCl4+Ar, freon 12 + oxygen.
EFFECT: enhancement of accuracy of manufacturing of micro-relief on the boundaries of discontinuity of the phase function of any configuration and widening of technological capabilities.
3 cl, 1 tbl.
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Authors
Dates
2012-02-10—Published
2010-01-22—Filed