FIELD: process engineering.
SUBSTANCE: invention may be used in cryogenics, electric-bulb production, chemical, oil-and-gas and nuclear industries. Sources of target components emission are arranged inside closed chamber 3. Sources of target components emission are devices the operation of which causes losses of target components, or the devices that allow extraction of target components by depressurisation. Target components obtained in operation of first devices are removed by varying the volume of said closed chamber 3, while target components produced via depressurisation are removed by feeding expelling gas flow via line 6 into chamber 3. Obtained flow enriched with target components is subjected to analysis aimed at detecting target components and additionally processed to produce concentrate to be treated to obtain pure components.
EFFECT: increased yield of target components, higher efficiency.
14 cl, 6 dwg
