RETURN PATH BETWEEN FIRST HIGH-VOLTAGE DC SUBSTATION AND SECOND HIGH-VOLTAGE DC SUBSTATION AND METHOD TO FORM RETURN PATH BETWEEN FIRST HIGH-VOLTAGE DC SUBSTATION AND SECOND HIGH-VOLTAGE DC SUBSTATION Russian patent published in 2011 - IPC H01R4/66 

FIELD: electricity.

SUBSTANCE: return path between the first high-voltage DC substation (HVDC-substation) (5) and the second HVDC-substation (6) comprises the first electrode (7), connected to the first HVDC-substation, and the second electrode (8), connected to the second HVDC-substation, the first part (11), containing a connecting conductor (9) and the first low-resistance area (4a), which penetrates through the Earth crust (3), where the first electrode (7) is installed, the second part (13), containing the Earth mantle (2), and the third part (12), containing the second low-resistance area (4b), which penetrates through the Earth crust (3), where the second electrode is installed (8).

EFFECT: improved conductivity of the return path through the ground between HVDC-substations.

4 cl, 2 dwg