METHOD OF CUTTING METALS AND SEMICONDUCTORS USING ELECTROPLASTIC DEFORMATION EFFECT Russian patent published in 2011 - IPC B23H5/06 B23B1/00 B23B35/00 B23C1/00 B23D1/00 

FIELD: process engineering.

SUBSTANCE: invention relates to machining of metals and semiconductors. Proposed method comprises machining combined with processing by electric current. Note here that, to facilitate plastification and reduce material resistance, current pulses are passed through the blank. Said current pulses feature duration of 100 to 150 mcs and repetition rate F defined by F = kV/h, where k is coefficient varying from 1 to 10, V is cutting tool feed rate, h is depth of cutting tool engagement, while current pulse amplitude Im is defined as Im = Jm·h·L, where Jm is current density varying from 350000 to 1000000 A/cm², and L is cutting tool width.

EFFECT: power savings, higher quality, reduced tool wear.

4 cl, 1 dwg