FIELD: physics.
SUBSTANCE: proposed method comprises first cleaning of blank with metal coat. Then, photo resist is applied on blank and dried. First thermal treatment, exposure, development and second thermal treatment are performed. Blank etching and second cleaning are conducted. After development, blank is additionally retouched by protective vanish. Blank etching comprises etching protective metal coat, relief chemical etching via protective photo resistive, vanish and metal coats and etching of metal coat after second cleaning. Vanish coat is removed after relief chemical etching and, prior to second cleaning, triggering is carried out. Relief chemical etching is performed by either paste etchant, or liquid etchant, or by etchant vapors.
EFFECT: high-precision arbitrary-topology optical scales with high surface finish.
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