FIELD: radio electronics. SUBSTANCE: process of manufacture of superthick (up to 0.6-0.9 mm) dielectric substrates with holes of any geometrical shape is based on machining of anodized substrate of aluminium with saturated solution of chromium anhydride prior to formation of photoresistive mask on it. EFFECT: improved quality of substrates due to provision for simultaneous etching of aluminium oxide over entire area.
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