METHOD OF DEPOSITING PRECISION PHOTOLITHOGRAPHIC PATTERN ON CYLINDRICAL SURFACE OF OPTICAL COMPONENT AND IMAGE CONTACT EXPOSURE DEVICE FOR REALISING SAID METHOD Russian patent published in 2014 - IPC G03F7/00 

FIELD: physics, optics.

SUBSTANCE: invention relates to electro-optical instrument-making and is designed to deposit a photolithographic pattern on the working surface of hat orifices of an optical-mechanical unit in a scanning device for generating code signal for controlling solar orientation of spacecraft. The method and device for realising said method include steps of depositing a chromium coating on a substrate, having a given radius of curvature R, made of optical glass by vacuum deposition, depositing a positive photoresist layer by a drip method on the working surface of a revolving substrate placed in a centrifuge, drying and heat treatment until full polymerisation of the photoresist layer and contact exposure of the image from a photographic mask by superposition and fixation thereof with the working surface of the obtained workpiece and subsequent illumination of the photoresist layer with a UV radiation source.

EFFECT: facilitating uniform deposition of a photoresist layer on the working surface of a substrate made of optical glass with a given radius of curvature, providing precise superposition and fixation of the working surface obtained after depositing the photoresist of the workpiece of an optical component, with subsequent uniform illumination of the photoresist layer with a UV radiation source.

9 cl, 6 dwg