FIELD: metallurgy.
SUBSTANCE: here is disclosed procedure for low temperature nitriding in plasma of non-self-maintained arc discharge of low pressure of technically pure titanium BT1-0 consisting in nitriding with utilisation of nitrogen-argon as plasma forming mixture. Nitriding is performed at temperature 400°C and there is used ion and electron component of plasma. Time of nitriding and amount of argon in plasma forming mixture is determined depending on required thickness of a modified layer.
EFFECT: raised operational characteristics of materials or items of technically pure titanium in coarse grained, NS or SMK state, improved quality and property of surface and maintaining structure of material in volume preliminary formed by means of procedures of intensive plastic deformation.
2 cl, 2 dwg, 2 ex
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