FIELD: metallurgy.
SUBSTANCE: procedure consists in installation of plasmatron into chamber with reduced pressure, in maintaining dynamic vacuum in chamber, in supply of plasma-like gas and powder of sputtered material into plasmatron and in sputtering material with supersonic flow of plasma in chamber with creation of vapour phase of sputtered material. A wall in form of obtuse angle ACB is set in the chamber at outlet section of the plasmatron in such way, that the said angle is external relative to an angle of deviation of part of CB of the wall from axis of a plasma jet amounting to not less, than 10 degrees. Sputtering is performed with expansion of supplied gas flow when a plasma jet flows round the said wall and forms a fan of waves of vacuum in its angular point (C). Nano particles are condensed from the vapour phase of sputtered material in plasma-initiating gas, settle on a substrate and form coating consisting of nano particles.
EFFECT: raised operational characteristics of coating, simplified process and increased ecological safety.
1 dwg
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Authors
Dates
2011-12-20—Published
2010-03-16—Filed