FIELD: metallurgy.
SUBSTANCE: plant is designed for vacuum deposition of metal layer on base material. Plant (10) includes body (25) catching the charges and arranged between cooling hollow roller (14) and neutralisation unit (23). Body (25) catching the charges catches the charged particles from neutralisation unit (23) to hollow roller (14). Charged particles flowing from neutralisation unit (23) are protected against reaching hollow roller (14), which suppresses the change of offset potential applied to hollow roller 14 for bringing it into close contact with base material (12) and maintains stable electrostatic attraction force relative to base material (12). Stable adhesion force is maintained between base material and cooling roller.
EFFECT: preventing thermal deformation of base material.
4 cl, 4 dwg
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