METHOD OF PRODUCTION OF ELECTROINSULATING GLASS ENAMEL Russian patent published in 2012 - IPC C03C8/20 

Abstract RU 2453514 C1

FIELD: metallurgy.

SUBSTANCE: frit of the following composition, wt % is melted: SiO2- 20.0-25.0; CaO- 4.5-12.0; SrO-1.0-2.0; CdO- 2.0-3.0; MnO- 0.1-0.5; K2O - 3.0-4.0; Na2O-1.0-1.5; B2O3- 5.0-5.5; CaF2-4.0-5.0; MoO3 - 0.5-0.8; Cr2O3 -0.5-0.8; Co2O3 -0.1-0.5; NiO - 0.1-1.0; Na3AlF6 - 0.1-0.5; BaO is the rest. Melting is carried out at 1150-1200 °C. The obtained product is crushed, and then injected 5-10% SrTiO3 of the frit weight.

EFFECT: increased dielectric permeability.

1 ex, 3 tbl

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RU 2 453 514 C1

Authors

Semin Mikhail Aleksandrovich

Novoselova Polina Nikolaevna

Dates

2012-06-20Published

2010-10-28Filed