METHOD TO MANUFACTURE THIN-FILM ANODE OF LITHIUM-ION ACCUMULATORS BASED ON FILMS OF NANOSTRUCTURED SILICON COATED WITH SILICON DIOXIDE Russian patent published in 2013 - IPC H01M4/04 H01M10/04 B82B1/00 

FIELD: electricity.

SUBSTANCE: thin-film material is formed from nanosize clusters of silicon in a shell of silicon dioxide, which are produced in a single stage by magnetron sputtering of a silicon target in plasma containing argon and controlled additives of oxygen. The specified nanostructured films are produced in the plasma of the magnetron discharge, containing 1-3% of oxygen by volume in argon. Content of the silicon dioxide in the film is within 16-41 wt %, and the nanostructured silicon in the shell of silicon dioxide has a cluster structure with cluster size of 5-15 nm.

EFFECT: increased specific capacitance and higher coulomb efficiency of negative electrodes in processes of charging and discharging in lithium-ion accumulators.

2 dwg