FIELD: radio engineering, communication.
SUBSTANCE: apparatus for plasma treatment of large regions has at least one flat antenna (A), having a plurality of interconnected elementary resonance closed circuits (M1, M2, M3), each of the closed circuits (M1, M2, M3) having at least two electroconductive circuit areas (1, 2) and at least two capacitors (5, 6). A high-frequency generator drives the antenna (A) on at least one of its resonance frequencies. A working chamber is located near the antenna (A). The antenna (A) generates a beam pattern of an electromagnetic field with a uniquely defined spatial structure, which enables to better control plasma generation.
EFFECT: high quality of processing.
14 cl, 18 dwg
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