FIELD: measuring equipment.
SUBSTANCE: invention relates to measurements by optical methods of electrophysical parameters of plasma, including electron density and electric field intensity and their distribution. Method of measuring spatial distribution of electron density of plasma includes measurement of intensity of plasma radiation from different coordinate areas of spark gap at wavelength, corresponding to spectral line of atomic or molecular band, which is selected so that radiation intensity of said line or band is mainly determined by excitation of radiating state by direct electron impact or fast compared with a period of high-frequency field cascade processes, with subsequent determination of spatial distribution of electron density of plasma by numerical simulation of plasma.
EFFECT: measurement by optical methods of electrophysical parameters of plasma.
1 cl, 5 dwg
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