METHOD OF PRODUCING MATERIAL CONTAINING FULLERENE AND SILICON Russian patent published in 2014 - IPC C01B31/02 C01B33/02 B82B3/00 B82Y40/00 

FIELD: chemistry.

SUBSTANCE: invention can be used in chemical industry. Material which contains fullerene and silicon is obtained by heat treatment of starting materials in a reaction chamber using a jet of high-temperature plasma. Fullerene (3) and silicon (4) are successively fed into said jet at different levels. Both components undergo sublimation and mutual coagulation of particles of said materials is carried out. The formed composition is exposed to a cyclonic stream of an inert gaseous medium (5), generated along the walls of the reaction chamber, on the periphery of the removed stream of material.

EFFECT: obtained material, which contains fullerene and silicon, has high conductivity and sensitivity to electromagnetic and acoustic signals.

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