FIELD: chemistry.
SUBSTANCE: invention relates to methods of correcting solutions for preliminary processing of metal substrates before superficial chemical processing. method includes addition to composition for preliminary processing of compensation composition with components, different from components of composition for preliminary processing, in which compensating composition includes: (a) dissolved fluoride complex of metal ion, in which metal ion includes metal of IIIA group, metal of IVA group, metal of IVB group or their combinations, and (b) component, including oxide, hydroxide, carbonate of metal of group IIIA, metals of group IVA, metals of IVB group or their combinations, and composition for preliminary processing in fact does not contain oxides, hydroxides and carbonates of metals of IIIA, IVA or IVB groups before addition to it of compensation composition. method includes addition to composition for preliminary processing of compensating composition with components, different from components of composition for preliminary processing, in which compensating composition includes: (a) component, including H2TiF6, H2ZrF6, H2HfF6, H2SiF6, H2GeF6, H2SnF6 or their combinations, and (b) component, including oxide, hydroxide or carbonate of titanium, zirconium, hafnium, aluminium, silicon, germanium, tin or their combinations, and composition for preliminary processing in fact does not contain oxides, hydroxides and carbonates of titanium, zirconium, hafnium, aluminium, silicon, germanium or tin before addition to it of compensating composition.
EFFECT: reduction of concentration of reaction products and formation of sludge in the process of preliminary processing.
21 cl, 2 tbl, 1 ex
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Authors
Dates
2014-06-10—Published
2010-10-05—Filed