FIELD: chemistry.
SUBSTANCE: method is based on the irradiation of a material surface by multiple focused ultrashort pulses (USP) femto- or short picosecond, pulses of a polarised electromagnetic field, instant - during each USP - excitation by them on the surface of superficial electromagnetic waves, interference during each USP of the USP falling on the surface and/or excited by them superficial plasmon-polaritons, on the surface, and local ablative removal of material after each USP from the areas of interference maximums on the surface of the photo-excited material with the formation of a regular single- or two-dimensional relief. The USP parameters - duration, central wavelength and spectrum width, spectral chirp, and the energy density are selected in such a way as to provide a resonance excitation of the superficial plasmon itself for a metal or electron-excited semi-conductor/dielectric from the entire branch of the superficial plasmon-polaritons, or directionally adjust the resonance of the superficial plasmon to the USP spectrum by the photoinduced change of the optic material constants under the USP impact, with the further dynamic support of the resonance excitation of the superficial plasmon during USP. The claimed method is realised by means of a respective device.
EFFECT: invention makes it possible to increase the spatial resolution of the method of subdiffractive single- and two-dimensional nanotexturing of the surface of various materials - metals, semiconductors, dielectrics - under an impact of multiple ultrashort pulses, with an increase of the periodicity of single- and two-dimensional superficial nanotexture.
5 cl, 5 dwg
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Authors
Dates
2014-11-27—Published
2013-04-12—Filed