METHOD OF PRODUCING HYDROPHOBIC OR HYDROPHILIC POROUS SILICON Russian patent published in 2015 - IPC C01B33/02 C25F3/12 C30B33/10 C30B29/06 B82B3/00 B82Y30/00 

Abstract RU 2555013 C1

FIELD: chemistry.

SUBSTANCE: method includes treating the surface of crystalline silicon by electrochemical etching in hydrofluoric acid solution with concentration of 20-30% while supplying current with surface density of 750-1000 mA/cm2 for 5-30 s to obtain hydrophobic silicon or supplying current with surface density of not more than 650 mA/cm2 for 5-30 s to obtain hydrophilic silicon.

EFFECT: method enables to obtain a surface with multimodal nano- or microporosity in a single step.

4 dwg

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RU 2 555 013 C1

Authors

Grunin Andrej Anatol'Evich

Chetvertukhin Artem Vjacheslavovich

Fedjanin Andrej Anatol'Evich

Mikhal'Kov Nikita Vladimirovich

Dates

2015-07-10Published

2014-08-25Filed