MAKING OF MICROSTRUCTURE ON SUBSTRATE Russian patent published in 2015 - IPC B42D25/324 

Abstract RU 2555663 C2

FIELD: process engineering.

SUBSTANCE: invention relates to making of microstructure on substrate and includes the steps that follow. (A) Production of donor film by making of embossed structure with ledges and recesses at first film material and application of transfer ply on embossed structure. (B) Making of acceptor film by application of glue ply on second film material. (C) Masking of donor film and acceptor film by glue ply. Note here that transfer ply at embossed structure ledges is glued with glue ply. (D) Transfer of glued sections onto acceptor film owing to separation of donor film from acceptor film. This results in formation of the first micro structure in acceptor film and/or in donor film second micro structure if formed to supplement said first micro structure. Besides, invention relates to application of produced substrate as a component of protective structure and to protective element produced as described above and to protected product.

EFFECT: higher efficiency.

25 cl, 29 dwg

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RU 2 555 663 C2

Authors

Vinfrid Khoffmjuller

Teodor Burkhard

Mikhaehl' Ram

Jozef Shinabek

Manfred Khajm

Andreas Raukh

Kristian Fuze

Dates

2015-07-10Published

2011-05-05Filed