DIODE OF PLASMA SHF-GENERATOR Russian patent published in 2015 - IPC H01J25/34 B82B3/00 

Abstract RU 2569493 C1

FIELD: electricity.

SUBSTANCE: device comprises vacuum chamber, which serves as grounded anode, with mounted explosion emission cathode that forms tubular flow of electrons, electrode mounted at the same axis with explosion emission cathode and grounded diaphragm limiting plasma from the above cathode and installed between explosion emission cathode and electrode, as well as cylinder-shaped metal spiral connecting electrode and explosion emission cathode and placed in the same axis with them. Diameter of metal spiral turns corresponds to diameter of tubular flow of electrons generated by the explosion emission cathode, and inductance L of the metal spiral is selected on condition of L>>UT/I, where U is cathode voltage, T is duration of voltage pulse at the cathode, I is current of tubular flow of electrons.

EFFECT: reduced distortion of emitted electromagnetic field and pulses generated in nanosecond range respectively.

1 dwg

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RU 2 569 493 C1

Authors

Loza Oleg Timofeevich

Ernyleva Svetlana Evgen'Evna

Gorodnichev Evgenij Borisovich

Bogdankevich Irina Leonidovna

Gusejn-Zade Namik Gusejnaga Ogly

Shul'Gina Elena Aleksandrovna

Dates

2015-11-27Published

2014-07-16Filed