FIELD: medicine.
SUBSTANCE: invention relates to method of manufacturing drug-dosing device. Method of processing component of drug-dosing device has at least one surface, coming in contact with drug in the process of storage or application of device, and includes the following stages: obtaining said component and covering at least one of surfaces by method of plasma deposition to reduce deposition of drug on the surface or drug destruction, in which at least part of the process of plasma deposition is realised under control of displacement by direct current at fixed direct displacement current to support constant emission of electrons and constant plasma density, with component being grounded at the stage of plasma deposition. Method of manufacturing drug-dosing device includes processing of device component by said method, obtaining other device components and assembling components.
EFFECT: increase of device exploitation characteristics.
15 cl, 2 dwg
Title | Year | Author | Number |
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DRUG-DOSING DEVICE | 2011 |
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Authors
Dates
2016-01-20—Published
2011-02-23—Filed