FIELD: measurement technology.
SUBSTANCE: invention relates to glaciology and can be used for correction of results of rack snow-measuring observations on snow mass sagging effect. Length of snow-measuring rack is measured before installation thereof into snow mass. Overshooting of rack over snow is measured immediately after installation. Depth of rack is calculated. Additional rack is installed next to main rack so that depth of its base is as short as possible. Determining, by the accurate level, vertical position of racks relative to each other. Re-evaluating relative vertical position of racks after a sufficiently long period of time. Calculating correction for growth of height of snow mass equal to lowering of additional rack relative to main rack.
EFFECT: simplification and improvement of accuracy of correction.
1 cl, 1 dwg
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