FIELD: technological processes.
SUBSTANCE: invention relates to production of large-size 3D shaped silicate glass blanks. At initial stage grinding is performed with powder of M60 brand at depth of 120-150 mcm for 4-6 hours, then polished surface is subjected to etching solution at solution temperature of 10-25 °C and duration of etching of 2-7.5 min, followed by washing with water with temperature of 40 °C for 10 minutes. Then, at intermediate stage glass is ground with powder of M28 brand at depth of 20-30 mcm for 8-10 hours, then polished surface is etched in etching solution for 2.5-5.5 min, followed by washing with water with temperature of 40 °C for 10 minutes. At final stage glass is ground powder of M14 brand at depth of 10-15 mcm for 15-18 hours, after which polished surface is subjected to multiple etching in etching solution at temperature of 20 °C with total etching duration of 24-51 min, After every cycle of etching glass is washed with water with temperature of 40 °C for 5 minutes, then glass is subjected to final polishing for 100-120 hours. Etching solution contains components at following ratios, wt%: HF - 15, H2SO4 - 10, H2O - 75.
EFFECT: reduced roughness of polished surface of items, reduced time of silicate 3D shells processing to optical quality.
1 cl
Title | Year | Author | Number |
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Authors
Dates
2016-08-27—Published
2014-05-15—Filed