FIELD: chemistry.
SUBSTANCE: in a method for pre-epitaxial treatment of the surface of a germanium substrate, the process of removing the natural germanium oxide layer from the surface of the substrate and the process of removing inorganic impurities from the surface of the substrate are carried out in a single step on a hydromechanical washing apparatus using a solution of NH4OH:H2O2:H2O=1:1:40 for 2-5 minutes at 19-23°C. Passivation of the surface of the substrate is not carried out.
EFFECT: invention reduces the number of steps of treating a substrate while improving the quality of the surface of the substrate at the same time.
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Authors
Dates
2015-01-10—Published
2013-10-03—Filed