METHOD FOR PRE-EPITAXIAL TREATMENT OF SURFACE OF GERMANIUM SUBSTRATE Russian patent published in 2015 - IPC H01L21/302 

Abstract RU 2537743 C1

FIELD: chemistry.

SUBSTANCE: in a method for pre-epitaxial treatment of the surface of a germanium substrate, the process of removing the natural germanium oxide layer from the surface of the substrate and the process of removing inorganic impurities from the surface of the substrate are carried out in a single step on a hydromechanical washing apparatus using a solution of NH4OH:H2O2:H2O=1:1:40 for 2-5 minutes at 19-23°C. Passivation of the surface of the substrate is not carried out.

EFFECT: invention reduces the number of steps of treating a substrate while improving the quality of the surface of the substrate at the same time.

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RU 2 537 743 C1

Authors

Belousov Viktor Sergeevich

Illarionov Vladimir Viktorovich

Lapshina Anastasija Anatol'Evna

Spitsyna Nadezhda Nikanorovna

Chebotarev Jurij Alekseevich

Chebotareva Anna Alekseevna

Dates

2015-01-10Published

2013-10-03Filed