DEVICE AND METHOD FOR GAS TREATMENT USING LOW-TEMPERATURE PLASMA AND CATALYST MEDIUM Russian patent published in 2016 - IPC B01D53/32 B01D53/86 

FIELD: technological processes; gas industry.

SUBSTANCE: invention relates to a device and a method of oxidation decomposition treatment of a hazardous gas. Gas treatment device comprises a flow channel through which a gas to be treated flows, a plasma-generating unit including a first electrode, a second electrode, a dielectric material, arranged inside flow channel, and a power-supply for AC power supply with output frequency 0.5 kHz or higher, wherein voltage is applied between first electrode and second electrode by power-supply unit to cause electrical discharge to occur, whereby plasma is generated, and a catalyst medium which is provided in a position where plasma generated by plasma-generating unit inside flow channel is present, is adapted for accelerating a reaction with gas to be treated and has metallic catalytic particles present on an inorganic substance.

EFFECT: efficient processing of hazardous gas at normal temperature.

13 cl, 12 dwg, 5 tbl, 51 ex