FIELD: measuring equipment.
SUBSTANCE: invention relates to measurement equipment and refers to substrate with covering layer surface topography determining method and device. Method includes substrate surface coating layer height measurement on x-y coordinates using white light chromatic measuring, said layer thickness measurement on x-y coordinates using ultraviolet interferometry and substrate surface height determining in x-y coordinates based on surface layer height and thickness measurement results. During measurements layer height and thickness sensors are located at same measurement point.
EFFECT: technical result consists in enabling possibility of coating surface and surface under coating topography simultaneous determination.
9 cl, 4 dwg, 1 tbl, 1 ex
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